X-ray diffraction microscopy: Reconstruction with partial magnitude and spatial a priori information

The goal is to nondestructively reconstruct the structure of a fabricated integrated circuit using x-ray diffraction measurement. In particular, to detect any deviation from the specification of the circuit design. Determining phase is critical. However, additional information exists as the phase of the design specification is known. Further phase information is determined by oversampling and a better estimate of the correct phase is obtained through convex optimization. The authors illustrate this technique with a simulated one dimensional example and a simple two dimensional experimental sample.